The minimum feature size that a projection photolithography system can print is limited by diffraction and is approximated by the Rayleigh criterion. The critical dimension (CD) is given by \(CD = k_1 \cdot \frac{\lambda}{NA}\), where \(\lambda\) is the wavelength of light, NA is the numerical aperture of the lens, and \(k_1\) is a process-related coefficient. Smaller features require shorter wavelengths or higher numerical apertures.





