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Thermal cvd apparatus and method for producing graphene
Patent published on the 2025-07-03 in WO under Ref WO2025142961 by AGC INC [JP] (Yoneta Kiyoto [jp], Ono Masashi [jp], Watanabe Hiroshi [jp], Yasui Yoji [jp], Yonemichi Tomohiro [jp])
Abstract: Provided is a thermal CVD apparatus for graphene production capable of suppressing heat unevenness inside a reaction vessel. The thermal CVD device for graphene production comprises: a reaction vessel in which a substrate for graphene production is housed; a gas supply section for supplying a raw material gas containing hydrocarbon; a gas discharge section for discharging gas from the inside of the reaction vessel; a heater for heating the inside of the reaction vessel; and a shielding member [...]
Our summary: Thermal CVD apparatus for producing graphene with heat suppression inside reaction vessel. Includes gas supply section, gas discharge section, heater, and shielding member. Shielding plates with defined aperture ratios for efficient heat transfer control.
thermal CVD, graphene production, apparatus, method
Patent
