Product Design, Manufacturing & Innovation Resources

أحدث المنشورات وبراءات الاختراع حول النقاط الكمية

النقاط الكمية

نصيحة: بالإضافة إلى التحديد أدناه، يمكنك البحث في قاعدتي بياناتنا بالكامل وتصفيتها:

> أداة البحث عن المنشورات المجانية < حسب المؤلف، أو الموضوع، أو الكلمات المفتاحية، أو التاريخ، أو المجلة.

> أداة البحث عن براءات الاختراع المجانية < للحصول على براءات اختراع باللغة الإنجليزية من مكتب براءات الاختراع الأوروبي.

هذه هي أحدث مجموعة مختارة من المنشورات وبراءات الاختراع العالمية باللغة الإنجليزية حول النقاط الكمية، بين العديد من المجلات العلمية على الإنترنت، مصنفة ومركزة على النقطة الكمية، والإكسيتون، والعائد الكمي، والبيكسيتون، واقتران فورستر، وتوليد الإكسيتونات المتعددة، والاقتران النفقي، والكوبت المغزلي، والنقطة الكمومية الخالية من الكادميوم، والتوسيع غير المتجانس، وتوليد الإكسيتونات المتعددة (MEG)، وإعادة تركيب أوجيه وCFQD.

Resist composition

Patent published on the 2026-07-02 in WO under Ref WO2026139451 by MERCK PATENT GMBH [DE] (Fackler Philipp Hans [de], Chen Jiawei [us], Wu Hengpeng [us], Okamura Toshiya [jp], Maturi Mark Marcello [de], Kozaki Rikio [jp], Si Kun [us], Suzuki Masato [jp], Ma Chenyang [us])

Abstract: The present application relates to novel compositions, methods for producing a resist film, methods for producing a resist pattern, methods for producing a processed substrate, methods for producing a device, and uses of the composition thereof. The formulation may exhibit at least one of properties as an advanced material or as a high performance material. The formulation may be used in the nanotechnology process to make semiconductor device/display device application, for example semiconductor[...]


Our summary: The application discusses novel resist compositions and their production methods. It highlights their use in creating resist films, patterns, and processed substrates. The formulations are intended for high-performance applications in semiconductor and display technologies.

resist composition, semiconductor devices, nanotechnology, advanced materials

Patent

Top coating composition

Patent published on the 2026-07-02 in WO under Ref WO2026139487 by MERCK PATENT GMBH [DE] (Kuwabara Shoji [jp], Hitokawa Hiroshi [jp], Kossoy Elizaveta [il], Dammel Ralph R [us], Azoubel Suzanna [il], Leader Avia [il])

Abstract: The present invention relates to a top coating composition comprising polymer (A), surfactant (B) and solvent (S). The polymer (A) comprises a side chain comprising a fused aromatic ring. The surfactant (B) comprises an aliphatic hydrocarbon portion (B1) and an alkylene oxide portion (B2). the solvent (S) comprises water (S1). The composition can be used for a top coat composition, which can exhibit at least one of properties of advanced material or high performance material. The composition can[...]


Our summary: The invention describes a top coating composition with polymer (A), surfactant (B), and solvent (S). Polymer (A) features a side chain with a fused aromatic ring, while surfactant (B) contains both aliphatic hydrocarbon and alkylene oxide portions. This composition is applicable in nanotechnology for advanced semiconductor and display devices.

top coating, polymer composition, surfactant, nanotechnology

Patent

Substrate cleaning liquid, method for producing substrate cleaned using same, and method for producing device

Patent published on the 2026-07-02 in WO under Ref WO2026139475 by MERCK PATENT GMBH [DE] (Nagahara Tatsuro [jp], Sugahara Shinji [jp], Yoshida Yuki [jp])

Abstract: [Problem] To obtain a substrate cleaning liquid capable of cleaning a substrate and removing particles. [Solution] A substrate cleaning liquid comprising a hydrophobic polymer (A), a polar compound (B), and a solvent (C): wherein the polar compound (B) is soluble in water. The substrate cleaning liquid is a highly functional material that can be used in a semiconductor device production step of a nanotechnology process, for example, a step of producing a semiconductor device that controls liquid[...]


Our summary: The content describes a substrate cleaning liquid that effectively removes particles. It includes a hydrophobic polymer, a polar compound, and a solvent. This cleaning liquid is designed for use in semiconductor device production, particularly in nanotechnology applications.

substrate cleaning, hydrophobic polymer, semiconductor device, nanotechnology

Patent

Technologies for closed-loop qubit calibration

Patent published on the 2026-07-01 in EP under Ref EP4769246 by INTEL CORP [US] (Levinger Run [us], Subramanian Sushil [us], Shumaker Evgeny [il])

Abstract: [0001] Technologies for closed-loop calibration of pulses to control spin qubits are disclosed. In an illustrative embodiment, calibration circuitry generates a pulse from a pulse generator. The pulse passes through a variable filter controlled by a filter parameter. The pulse is provided to a qubit, and the qubit is measured. Depending on the measured state of the qubit, the filter parameter can be changed. In this manner, the control pulses can be quickly and continuously calibrated. The calib[...]


Our summary: Technologies for closed-loop calibration of spin qubits are presented. The calibration circuitry adjusts filter parameters based on qubit measurements. This approach minimizes noise and is scalable for multiple qubits.

closed-loop calibration, qubit control, pulse generation, integrated circuit

Patent

Imaging device, imaging system, and method for manufacturing the imaging system

Patent published on the 2026-06-24 in EP under Ref EP4763046 by TAIZHOU GUANYU TECH CO LTD [CN] (Hsu Shun-cheng [cn], Wei Li-chen [tw], Chen Huei-siou [tw], Hsu Kuo-cheng [tw])

Abstract: [0001] The disclosure relates to an imaging device, an imaging system, and a method for manufacturing the imaging system. The imaging system includes a processor and a distal system. The distal system is electrically connected to the processor. The distal system includes an image sensor structure and a light emitting device. The light emitting device includes an organic light emitting device (OLED), a micro light emitting diode (micro-LED), a quantum dot light emitting diode (QLED), or any combi[...]


Our summary: The document describes an imaging device and system that includes a processor and a distal system. The distal system features an image sensor structure and a light emitting device, which can be OLED, micro-LED, or QLED. The organic light emitting device is structured with electrodes and reflective surfaces to create a micro resonant cavity.

imaging device, imaging system, OLED, micro-LED

Patent

Carbon quantum dots and methods of preparation thereof

Patent published on the 2026-06-18 in US under Ref US20260167863 by RAMOT AT TEL AVIV UNIV LTD [IL] (Kumar Vijay Bhooshan [il], Gazit Ehud [il])

Abstract: [0000] The present invention provides a carbon quantum dot (CQD) derived from an N-containing organic precursor, comprising a graphitic core and a passivation shell layer. The CQD possesses enhanced optical and electrical properties and is therefore advantageous for use in applications such as optoelectronic devices, bioimaging, biosensing, and manipulation of cellular organelles in vivo. Further provided is a modified hydrothermal method for synthesizing and obtaining the CQD.[...]


Our summary: The invention presents carbon quantum dots (CQDs) derived from an N-containing organic precursor with a graphitic core and passivation shell. These CQDs exhibit improved optical and electrical properties suitable for optoelectronic devices, bioimaging, and biosensing applications. A modified hydrothermal method for synthesizing the CQDs is also provided.

carbon quantum dots, N-containing organic precursor, optical properties, hydrothermal method

Patent

quantum dot lasers and the end of the optical isolator

Published on 2026-05-08 by Shujie Pan, Junjie Yang, Siming Chen @NATURE

Abstract: Light: Science & Applications, Published online: 08 May 2026; doi:10.1038/s41377-026-02290-wQuantum dot (QD) lasers enable intrinsically feedback-tolerant, isolator-free silicon photonic integrated circuits (PICs), eliminating the bulky optical isolators traditionally required to suppress destabilizing reflections. Owing to their delta-function-like density of states, near-zero linewidth enhancement factor, and strong damping, QD lasers sustain stable, high-speed operation without coherence [...]


Our summary: Quantum dot lasers eliminate the need for optical isolators in silicon photonic integrated circuits. They provide stable, high-speed operation under extreme optical feedback. This technology facilitates compact and scalable optical interconnects for industrial applications.

quantum dot lasers, optical isolators, silicon photonics, integrated circuits

Publication

Long-lived excitonic beatings in finite chains under adiabatic motion

Published on 2026-05-08 by Ritesh Pant, Sebastian Wster and Alexander Eisfeld @IOP SCIENCE

Abstract: We investigate transport of a Frenkel exciton in finite one-dimensional chains, where temperature induced interparticle vibrations dynamically modulate the electronic couplings between neighboring particles. In the adiabatic regime, where vibrational motion is slower than excitation transfer between sites, this modulation gives rise to long-lived oscillations in the exciton populations. These oscillations, which we refer to as adiabatic beatings, are most pronounced at the boundaries of the chai[...]


Our summary: This study explores the transport of a Frenkel exciton in finite one-dimensional chains under adiabatic conditions. Long-lived oscillations, termed adiabatic beatings, emerge due to temperature-induced interparticle vibrations modulating electronic couplings. The amplitude of these beatings varies with chain length and particle parity, and they persist even in the presence of disorder.

Frenkel exciton, adiabatic motion, exciton populations, interparticle vibrations

Publication

المواضيع المغطاة: العناصر الأرضية النادرة، والطلاء بالحاجز الحراري، والبنية المجهرية، والخصائص الميكانيكية، والتركيب الاحتراقي بالمحلول، وصلابة فيكرز، وصلابة الكسر، والتوسع الحراري، وتأثير هول، والمخدّر، والبيروفسكايت، ومقاومة التآكل، واختبار الدورة الحرارية، وصقل الحبوب، والأداء في درجات الحرارة العالية، وكثافة ناقل الشحنة، وخصائص النقل، والمنظمة الدولية للتوحيد القياسي، والمنظمة الدولية للتوحيد القياسي، والمعهد الأمريكي للمعايير الوطنية (ANSI)، واللجنة الكهروتقنية الدولية (IEC)، والمنظمة الدولية للمعايير (ISO).

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