投影式光刻系统可打印的最小特征尺寸受衍射限制,并可用瑞利判据近似确定。临界尺寸 (CD) 由公式 [latex]CD = k_1 cdot frac{lambda}{NA}[/latex] 给出,其中 [latex]lambda[/latex] 为光波长,NA 为透镜数值孔径,[latex]k_1[/latex] 为工艺相关系数。更小的特征尺寸需要更短的波长或更高的数值孔径。

(图片仅供参考)
投影式光刻系统可打印的最小特征尺寸受衍射限制,并可用瑞利判据近似确定。临界尺寸 (CD) 由公式 [latex]CD = k_1 cdot frac{lambda}{NA}[/latex] 给出,其中 [latex]lambda[/latex] 为光波长,NA 为透镜数值孔径,[latex]k_1[/latex] 为工艺相关系数。更小的特征尺寸需要更短的波长或更高的数值孔径。
The Rayleigh criterion is a fundamental principle in optics that defines the limit of resolution for any imaging system, including the projection systems used in photolithography. It states that two point sources are just resolvable when the center of the diffraction pattern of one is directly over the first minimum of the diffraction pattern of the other. In the context of lithography, this translates to the smallest line or space that can be reliably printed. The formula [latex]CD = k_1 \cdot \frac{\lambda}{NA}[/latex] encapsulates the three primary levers for improving resolution. Firstly, reducing the wavelength ([latex]\lambda[/latex]) of the light source has been a major driver of progress, moving from g-line (436 nm) and i-line (365 nm) mercury lamps to Deep UV (DUV) excimer lasers like KrF (248 nm) and ArF (193 nm), and ultimately to Extreme UV (EUV) at 13.5 nm. Secondly, increasing the numerical aperture (NA) of the projection lens allows it to capture more diffracted light orders, leading to a sharper image. NA is defined as [latex]NA = n \sin \theta[/latex], where n is the refractive index of the medium between the lens and the wafer. Thirdly, the process factor [latex]k_1[/latex] represents the ‘cleverness’ of the process, encompassing improvements like resolution enhancement techniques (RET), photoresist chemistry, and process control. While theoretically [latex]k_1[/latex] has a minimum of 0.25, practical manufacturing values have been pushed down from ~0.8 towards ~0.3 through immense engineering effort. This equation has been the guiding principle for the semiconductor industry’s roadmap for decades, driving the relentless scaling predicted by Moore’s Law.
瑞利判据(光学分辨率)
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