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» 瑞利判据(光学分辨率)

瑞利判据(光学分辨率)

1900
  • John William Strutt, 3rd Baron Rayleigh
说明光学中瑞利准则的投影光刻系统。.

(图片仅供参考)

投影式光刻系统可打印的最小特征尺寸受衍射限制,并可用瑞利判据近似确定。临界尺寸 (CD) 由公式 [latex]CD = k_1 cdot frac{lambda}{NA}[/latex] 给出,其中 [latex]lambda[/latex] 为光波长,NA 为透镜数值孔径,[latex]k_1[/latex] 为工艺相关系数。更小的特征尺寸需要更短的波长或更高的数值孔径。

The Rayleigh criterion is a fundamental principle in optics that defines the limit of resolution for any imaging system, including the projection systems used in photolithography. It states that two point sources are just resolvable when the center of the diffraction pattern of one is directly over the first minimum of the diffraction pattern of the other. In the context of lithography, this translates to the smallest line or space that can be reliably printed. The formula [latex]CD = k_1 \cdot \frac{\lambda}{NA}[/latex] encapsulates the three primary levers for improving resolution. Firstly, reducing the wavelength ([latex]\lambda[/latex]) of the light source has been a major driver of progress, moving from g-line (436 nm) and i-line (365 nm) mercury lamps to Deep UV (DUV) excimer lasers like KrF (248 nm) and ArF (193 nm), and ultimately to Extreme UV (EUV) at 13.5 nm. Secondly, increasing the numerical aperture (NA) of the projection lens allows it to capture more diffracted light orders, leading to a sharper image. NA is defined as [latex]NA = n \sin \theta[/latex], where n is the refractive index of the medium between the lens and the wafer. Thirdly, the process factor [latex]k_1[/latex] represents the ‘cleverness’ of the process, encompassing improvements like resolution enhancement techniques (RET), photoresist chemistry, and process control. While theoretically [latex]k_1[/latex] has a minimum of 0.25, practical manufacturing values have been pushed down from ~0.8 towards ~0.3 through immense engineering effort. This equation has been the guiding principle for the semiconductor industry’s roadmap for decades, driving the relentless scaling predicted by Moore’s Law.

UNESCO Nomenclature: 2209
- 电磁学

类型

抽象系统

中断

基础

用法

广泛使用

前体

  • 惠更斯-菲涅耳波传播原理
  • 夫琅禾费衍射理论
  • 开发高质量光学镜头

应用程序

  • 高分辨率显微镜的设计
  • 半导体光刻工艺开发
  • 天文望远镜设计
  • 光盘(CD、DVD、蓝光光盘)的数据存储密度限制

专利:

NA

潜在创新理念

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相关术语:瑞利判据、分辨率、数值孔径、波长、k1因子、衍射极限、光刻技术、深紫外、极紫外、光学。

历史背景

瑞利判据(光学分辨率)

1900
1900
1900
1900
1902
1902
1907
1900
1900
1900
1900
1900-12-14
1902
1904
1907

(如果日期未知或不相关,例如“流体力学”,则提供其显著出现的近似估计)

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