Chemical Vapor Deposition (CVD)

Chemical vapor deposition (CVD) is a materials-processing technique in which volatile precursor gases are delivered to a heated substrate where they chemically react or decompose to form a conformal solid film or 涂层. It enables high-purity, uniform, and compositionally controlled thin films (metals, oxides, nitrides, carbides and semiconductor compounds) used across product design, R&D and production for electronics, optics, protective coatings, 微机电系统 and catalysts. By tuning parameters such as temperature, pressure, gas flow and precursor chemistry—and by choosing variants like LPCVD, PECVD or MOCVD—CVD can be optimized for film microstructure, performance, throughput and scalability from lab to volume manufacture.