Physical Vapor Deposition (PVD)

物理 Vapor Deposition (PVD) is a vacuum 涂层 process used to deposit thin films of material onto various substrates, enhancing their surface properties. This technique involves the physical transformation of a solid material into vapor, which then condenses onto the target surface, creating a uniform and adherent coating. PVD is widely employed in industries such as electronics, optics, and aerospace for its ability to produce durable, high-performance coatings with precise control over thickness and composition.